IIT Mandi researchers develop anti-bacterial, self-cleaning material for face masks and PPE equipment
IIT Mandi latest research: The developed nanomaterial can clean the mask by simply keeping it in bright sunlight and make it ready to wear again.
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IIT Mandi researchers develop anti-bacterial, self-cleaning material for face masks and PPE equipment
Indian Institute of Technology Mandi researchers has developed a virus-filtering, self-cleaning and antibacterial material that can be used to make face masks and other PPE equipment.
This path-breaking development of Dr Amit Jaiswal, Assistant Professor, School of Basic Sciences, IIT Mandi, along with his research scholars, Mr Praveen Kumar, Mr Shounak Roy, and Ms Ankita Sarkar comes at a time in which it has become imperative to develop techniques to stop the second wave of the Covid-19 pandemic in the country.
New anti-bacterial material to help reuse of face masks, PPE
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Nanotechnology Now - Press Release: New tech builds ultralow-loss integrated photonic circuits
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Credit: Jijun He, Junqiu Liu (EPFL)
Encoding information into light, and transmitting it through optical fibers lies at the core of optical communications. With an incredibly low loss of 0.2 dB/km, optical fibers made from silica have laid the foundations of today s global telecommunication networks and our information society.
Such ultralow optical loss is equally essential for integrated photonics, which enable the synthesis, processing and detection of optical signals using on-chip waveguides. Today, a number of innovative technologies are based on integrated photonics, including semiconductor lasers, modulators, and photodetectors, and are used extensively in data centers, communications, sensing and computing.
Water and quantum magnets share critical physics
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