Collaboration looks to accelerate hyperscale computing SoC design
Cadence Design Systems has revealed that it has optimised the Cadence digital 20.1 full flow for Samsung Foundryâs advanced-process technologies down to 4nm.
As a consequence of the company's collaboration designers can now use Cadence tools to achieve optimal power, performance, and area (PPA) and deliver accurate, first-pass silicon for hyperscale computing applications.
Cadence's digital 20.1 flow is able to provide capabilities that are well-suited for Samsung Foundryâs advanced-process technologies. For example, the iSpatial technology allows a seamless transition from the Genus Synthesis Solution to the Innovus Implementation System using a common user interface and database.