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Imec readies High-NA EUV scanner for first wafers

Imec has demonstrated that High-NA EUV is ready for transferring the EUV processes into the joint imec-ASML High-NA EUV Lab, built around the first

Steven scheerAdvanced patterning

Newswire & Press Release / Imec Demonstrates Readiness of the High-NA EUV Patterning Ecosystem - Electronics / Instrumentation / RFID - Imec

Newswire & Press Release / Imec Demonstrates Readiness of the High-NA EUV Patterning Ecosystem - Electronics / Instrumentation / RFID - Imec
newswiretoday.com - get the latest breaking news, showbiz & celebrity photos, sport news & rumours, viral videos and top stories from newswiretoday.com Daily Mail and Mail on Sunday newspapers.

United statesSan franciscoRegion flamandeSteven scheerElectronics instrumentationMicroelectronics shanghai coAgency sourceIndia privateUnited states nanoelectronics design center incTaiwan coBanner ad hereAffiliate programsPatterning conferenceAdvanced patterningFlemish governmentPrivate limited

Imec showcases High-NA EUV breakthroughs as joint lab with ASML soon becomes operational

Imec showcases High-NA EUV breakthroughs as joint lab with ASML soon becomes operational
digitimes.com - get the latest breaking news, showbiz & celebrity photos, sport news & rumours, viral videos and top stories from digitimes.com Daily Mail and Mail on Sunday newspapers.

Steven scheerAdvanced patterning

Embracing Chaos: The Imperfect Art of Semiconductor Manufacturing And Lithography

5 Longs, Intel EUV Delayed Again, And More

Chris mackMeteor lakeLotus eliseAdvanced patterningLocal edge placementCritical dimension uniformityEdge roughnessWidth roughnessProximity correction

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