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Applied Materials' New eBeam Metrology System Paves the Way to High-NA EUV Lithography

February 28, 2023

28.02.2023 - New VeritySEM 10 system delivers industry-leading resolution and imaging speed to help chipmakers accelerate process development and maximize yield in high-volume manufacturing SANTA CLARA, Calif., Feb. 28, 2023 (GLOBE NEWSWIRE) - Applied ...

Ricky Gradwohl Keith Wells Michael Sullivan Group Vice Materials Inc Group Vice President

Source: wallstreet-online.de

Applied Materials' Innovative Pattern-Shaping Technology

February 28, 2023

The new Centura® Sculpta® patterning system provides a simpler, faster and more cost-effective alternative to EUV double patterning SANTA CLARA, Calif.,...

Ryan Russell Ricky Gradwohl Dan Hutcheson Prabu Raja Michael Sullivan Centura Sculpta

Source: globenewswire.com

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Advanced Patterning Products Launch News Today

Applied Materials' New eBeam Metrology System Paves the Way to High-NA EUV Lithography

Applied Materials' Innovative Pattern-Shaping Technology

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