Electron diffraction patterns obtained on a TEM contain elliptical distortion resulting from column defects. This distortion can be corrected by applying offsets to the objective lens stigmators to cancel distortions occurring further down the column. In this work, a DigitalMicrographTM script-based method has been developed to identify the optimum objective stigmator settings which produce a distortion minimum in diffraction. Initially, a manual (by eye) correction is used to determine the stigmator values necessary to bring the pattern distortion below the threshold at which it is no longer visible to the naked eye (<1%). Thereafter, an automated acquisition script is used to acquire matrices of diffraction patterns while varying the stigmator values about the values which were identified as producing a distortion minimum in the preceding step. This analysis can be applied iteratively to refine the location of the distortion minimum, using progressively finer step changes in objec