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Incorporating Zinc to Stabilize Indium Sulfide for CO2 Reduction Reaction

Inspired by earlier researchers, scientists have recently incorporated zinc (Zn) into indium sulfide (In2S3). They found that the synthesis allows this incorporation and enhances the stability of the resultant catalyst (ZnIn2S4). The research has been published in Nature Communications.
United States South Korea Electrochimica Acta Nature Communications Angewandte Chemie International Edition Solid State Communications

Sleep institute hops into sensor trial

Photo: Getty Images Flinders University sleep experts are becoming embedded in a new trial to help people with their individual sleep disorders – via tests on a new mattress sensor. The sleep disorder diagnosis and monitoring trial will be conducted using invisible sensor technology, REMi – developed by RMIT University for Melbourne-based R&D company Sleeptite – to investigate its capability as a validation tool for sleep disorders. Flinders University research lead Associate Professor An...
Flinders University South Australia Madhu Bhaskaran Sleeptite Remi Andrew Vakulin University For

Nanotechnology Now - Press Release: Stress-free path to stress-free metallic films paves the way for next-gen circuitry: Optimized sputtering technique helps minimize stress in tungsten thin films

Our NanoNews Digest Sponsors Home > Press > Stress-free path to stress-free metallic films paves the way for next-gen circuitry: Optimized sputtering technique helps minimize stress in tungsten thin films (top left) An illustration of the HiPIMS process (top right) The energy distribution of tungsten ions arriving at the substrate over time. At short times, there are a large proportion of ions with high energy. (bottom) Stress-free tungsten films created with the selective pulsed bias technique...
Japan General Tetsuhide Shimizu Research Awards Scholarships Gifts Contests Honors Records Tokyo Metropolitan University Swedish Research Council No Society International Research Congress

Stress-free path to stress-free metallic films paves the way for next-gen circuitry

 E-Mail IMAGE: (top left) An illustration of the HiPIMS process (top right) The energy distribution of tungsten ions arriving at the substrate over time. At short times, there are a large proportion... view more  Credit: Tokyo Metropolitan University Tokyo, Japan - Researchers from Tokyo Metropolitan University have used high power impulse magnetron scattering (HiPIMS) to create thin films of tungsten with unprecedentedly low levels of film stress. By optimizing the timing of a "subst...
Tetsuhide Shimizu Swedish Research Council No University Faculty Grant Japan Society For The Promotion Of Science Tokyo Metropolitan University Associate Professor Tetsuhide Shimizu

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AI-aided search for single-atom-alloy catalysts yields more than 200 promising candidates

AI-aided search for single-atom-alloy catalysts yields more than 200 promising candidates "The developed methodology can be easily adapted to designing new functional materials for various applications" pixabay.com ").addClass("image-details"); var $imageCaption = $("").addClass("image-caption").text(caption); $imageDetails.append($imageCaption); element = $(" ").append(×).append($imageHolder).append($imageDetails)[0]; ...
Sergey Levchenko Energy Science Skoltech Center Assistant Professor Single Atom Catalysts Artificial Intelligence

New material could create 'neurons' and 'synapses' for computers -- Science & Technology -- Sott.net

© Illustration Banerjee group Schematic of the proposed device structure for neuromorphic spintronic memristors. The write path is between the terminals through the top layer (black dotted line), the read path goes through the device stack (red dotted line). The right side of the figure indicates how the choice of substrate dictates whether the device will show deterministic or probabilistic behavior.Classic computers use binary values (0/1) to perform. By contrast, our brain cells can use mor...
Mina Leivisk Anouk Goossens Tamalika Banerjee University Of Groningen First University Of Groningen Zernike Institute For Advanced Materials
Source: sott.net

Global Advanced Functional Materials Market Size, Growth Factors 2021: Latest Study Focuses On Current And Future Innovations (Covestro AG, BASF SE, Samsung Electro Mechanics Company, DowDuPont Inc) – KSU

/Global Advanced Functional Materials Market Size, Growth Factors 2021: Latest Study Focuses On Current And Future Innovations (Covestro AG, BASF SE, Samsung Electro Mechanics Company, DowDuPont Inc) Global Advanced Functional Materials Market Size, Growth Factors 2021: Latest Study Focuses On Current And Future Innovations (Covestro AG, BASF SE, Samsung Electro Mechanics Company, DowDuPont Inc) stevenMay 15, 2021 Advanced Functional Materials Market Research Report Offers Insights Into Market ...
Momentive Performance Materials Inc Kyocera Corporation Electrical Electronics Renesola Ltd Dowdupont Inc Ceradyne Inc

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