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X-Ray Photoelectron Spectroscopy in Surface Analysis

X-ray photoelectron spectroscopy (XPS) has become an indispensable characterization technique for analyzing the surface chemistry of thin films and coatings. With its ability to probe just the top few nanometers and reveal elemental composition, chemical bonding, and electronic structure, XPS provides unparalleled insights into how surface and interface properties determine film performance.
Owais Aliaug Owais Ali Alexander Gatsenko Shutterstock Materials Technology Journal Of Vacuum Science Technology Montana State University

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