Toppan Photomask has entered into a joint research and development agreement with IBM related to the 2 nanometer (nm) logic semiconductor node, using extreme ultraviolet (EUV) lithography. The agreement also includes High-NA EUV photomask development capability on next-generation semiconductors.
/PRNewswire/ Toppan Photomask, the world s premier semiconductor photomask provider, announced that it has entered into a joint research and development.
Asia report: Markets mixed as Beijing keeps rates on hold hl.co.uk - get the latest breaking news, showbiz & celebrity photos, sport news & rumours, viral videos and top stories from hl.co.uk Daily Mail and Mail on Sunday newspapers.
Japan s Nikkei 225 and Topix exploded higher: more upside? invezz.com - get the latest breaking news, showbiz & celebrity photos, sport news & rumours, viral videos and top stories from invezz.com Daily Mail and Mail on Sunday newspapers.
In a groundbreaking collaboration, E Ink Holdings and Papercast Ltd have joined forces to introduce a cutting-edge solar-powered e-paper passenger information