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Toppan and IBM to advance development of EUV photomasks

Toppan Photomask has entered into a joint research and development agreement with IBM related to the 2 nanometer (nm) logic semiconductor node, using extreme ultraviolet (EUV) lithography. The agreement also includes High-NA EUV photomask development capability on next-generation semiconductors.

Toppan Photomask Signs Agreement with IBM for Joint R&D on Semiconductor EUV Photomasks

/PRNewswire/ Toppan Photomask, the world s premier semiconductor photomask provider, announced that it has entered into a joint research and development.

Asia report: Markets mixed as Beijing keeps rates on hold

Asia report: Markets mixed as Beijing keeps rates on hold
hl.co.uk - get the latest breaking news, showbiz & celebrity photos, sport news & rumours, viral videos and top stories from hl.co.uk Daily Mail and Mail on Sunday newspapers.

Japan s Nikkei 225 and Topix exploded higher: more upside?

Japan s Nikkei 225 and Topix exploded higher: more upside?
invezz.com - get the latest breaking news, showbiz & celebrity photos, sport news & rumours, viral videos and top stories from invezz.com Daily Mail and Mail on Sunday newspapers.

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