Toppan Photomask has entered into a joint research and development agreement with IBM related to the 2 nanometer (nm) logic semiconductor node, using extreme ultraviolet (EUV) lithography. The agreement also includes High-NA EUV photomask development capability on next-generation semiconductors.
/PRNewswire/ Toppan Photomask, the world s premier semiconductor photomask provider, announced that it has entered into a joint research and development.
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In a groundbreaking collaboration, E Ink Holdings and Papercast Ltd have joined forces to introduce a cutting-edge solar-powered e-paper passenger information