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CMP Slurry Market – Overview From their earliest recorded use for polishing lenses, the natural transfer of technology to semiconductor polishing slurries in the early 1980s is a wonder. Primarily, the reason was the need to planarize the next-generation IC devices used then, in a way that was more reliable and reproducible than what the existing technology available at that time allowed. While, the application of slurry in semiconductor technology was a leap, the slurry composition remained unchanged from the one that was used in polishing of lenses. However, as semiconductor based electronic devices became more complex, the chemical mechanical planarization (CMP) defects manifested as limited yields. This resulted in more attention on finer details of CMP, with the slurry in particular attracting research for scope of innovation and improvements. With the keen interest of researchers, electronic design experts, and some scientific communities in CMP slurry that closely influen

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