Page 6 - டோக்கியோ பெருநகர பல்கலைக்கழகம் News Today : Breaking News, Live Updates & Top Stories | Vimarsana

Tokyo Metropolitan University Researchers from Tokyo Metropolitan University have used high power impulse magnetron scattering (HiPIMS) to create thin films of tungsten with unprecedentedly low levels of film stress. By optimizing the timing of a “substrate bias pulse” with microsecond precision, they minimized impurities and defects to form crystalline films with stresses as low as 0.03 GPa, similar to those achieved through annealing. Their work promises efficient pathways for creating metallic films for the electronics industry. Modern electronics relies on the intricate, nanoscale deposition of thin metallic films onto surfaces. This is easier said than done; unless done right, “film stresses” arising from the microscopic internal structure of the film can cause buckling and curving over time. Getting rid of these stresses usually requires heating or “annealing”. Unfortunately, many of the best metals for the job e.g. tungsten have high melting points, meaning that

Tetsuhide shimizuTokyo metropolitan universityAssociate professor tetsuhide shimizuடோக்கியோ பெருநகர பல்கலைக்கழகம்