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Applied Materials' New eBeam Metrology System Paves the Way to High-NA EUV Lithography - Vimarsana News

Applied Materials' New eBeam Metrology System Paves the Way to High-NA EUV Lithography

Published: February 28, 2023

28.02.2023 - New VeritySEM 10 system delivers industry-leading resolution and imaging speed to help chipmakers accelerate process development and maximize yield in high-volume manufacturing SANTA CLARA, Calif., Feb. 28, 2023 (GLOBE NEWSWIRE) - Applied ...

Source: wallstreet-online.de
Related Topics:
Ricky GradwohlKeith WellsMichael SullivanGroup ViceMaterials IncGroup Vice PresidentProcess ControlAdvanced Patterning Products LaunchApplied Materials
Applied Materials' Innovative Pattern-Shaping Technology - Vimarsana News

Applied Materials' Innovative Pattern-Shaping Technology

Published: February 28, 2023

The new Centura® Sculpta® patterning system provides a simpler, faster and more cost-effective alternative to EUV double patterning SANTA CLARA, Calif.,...

Source: globenewswire.com
Related Topics:
Ryan RussellRicky GradwohlDan HutchesonPrabu RajaMichael SullivanCentura SculptaSemiconductor Products GroupIntel CorpMaterials IncApplied MaterialsSenior Vice PresidentGeneral ManagerJong Chul ParkFoundry Etch Technology TeamVice ChairAdvanced Patterning Products LaunchNasdaq AmatApplied Materials