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Towards Higher Nanopatterning Resolution with Molecules that fill Nanogaps Better

Ultraviolet nanoimprint lithography (UV-NIL) is a method of creating patterns at the nanoscale with widespread applications in optoelectronics, photonics, and biology due to its low cost and scalability. However, current UV-NIL resolution is limited below 10 nm, and higher resolutions require a better understanding of the UV-NIL process. In a new study, researchers from Tokyo… ....

Tadashi Ando , Tokyo University Of Science , Towards Higher Nanopatterning Resolution , Tokyo University , Associate Professor Tadashi Ando , Molecular Dynamics Study , Resist Molecules , Nanoimprint Lithography Filling , Nobel Prize ,