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Characterizing the surface topography of materials and devices is vital to determine their mechanical and physical properties. This article will look at the field of surface metrology and how atomic force microscopy (AFM) can benefit the analysis of complex surface features.
One of the most important processes in the manufacture of semiconductor hard disk and LED wafers is chemical mechanical planarization (CMP)
Improved speed, precision and flexibility — it is important to take advantage of every possible opportunity in optimizing production. To this end, researchers at the Fraunhofer Institute for Material and Beam Technology IWS have developed SURFinpro, a solution that uses artificial intelligence and optical measurement technology to detect, classify and visualize defects in real time, and report them to the plant carrying out the production. The experts will be presenting their system from June 27 to 30, 2023, at Laser World of Photonics, joint Fraunhofer Booth 441 in Hall A3.
Advanced sensors equipped with smart computer chips, connectivity technology, and artificial intelligence are bringing the metrology industry into the twenty-first century.
...While optical sensing safety technology can reduce warehouse transportation accidents.