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The Vistec SB3050-2 is the most advanced electron beam lithography system with variable-shaped beam technology, allowing a wide range of applications in research and development, prototyping, and small-volume production.
As a long-standing equipment supplier, Vistec Electron Beam GmbH is providing leading technology solutions for advanced electron-beam lithography (EBL).
As a long-standing equipment supplier, Vistec Electron Beam GmbH is providing leading technology solutions for advanced electron-beam lithography (EBL).
The SB254 provides high performance electron-beam lithography at a cost-effective rate. It enables the handling of various compound semiconductor materials.