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Ultraviolet nanoimprint lithography (UV-NIL) is a method of creating patterns at the nanoscale with widespread applications in optoelectronics, photonics, and biology due to its low cost and scalability. However, current UV-NIL resolution is limited below 10 nm, and higher resolutions require a better understanding of the UV-NIL process. In a new study, researchers from Tokyo…

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Japan ,Tokyo ,Tadashi Ando ,Tokyo University Of Science , ,Towards Higher Nanopatterning Resolution ,Tokyo University ,Associate Professor Tadashi Ando ,Molecular Dynamics Study ,Resist Molecules ,Nanoimprint Lithography Filling ,Nobel Prize ,

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