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Imec Demonstrates 20nm Pitch Line/Space Resist Imaging with High-NA EUV Interference Lithography

The achievement marks a major milestone of imec and KMLabsโ€™ AttoLab LEUVEN (Belgium), 09 February, 2021 โ€” Imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, reports for the first time the use of a 13.5 nm High Harmonic Generation source for the printing of 20nm pitch line/spaces using interference lithographic imaging of an Inpria metal-oxide resist under high-numerical-aperture (high-NA) conditions. The demonstrated high-NA capability of the EUV ...
United States Region Flamande Andrew Grenville John Petersen High Harmonic Generation Principal Scientist

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