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August 31, 2023
Several efforts in the aftermarket show a common theme that could improve MRO efficiencies.
May 26, 2022
SANTA CLARA, Calif., May 26, 2022 (GLOBE NEWSWIRE) -- Applied Materials, Inc. today introduced a new system that re-engineers the deposition of...
May 26, 2022
SANTA CLARA, Calif., May 26, 2022 (GLOBE NEWSWIRE) -- Applied Materials, Inc. today introduced a new system that re-engineers the deposition of transistor wiring to significantly reduce electrical resistance, which has become a critical bottleneck to further improvements in chip performance and power. Chipmakers are using advances in lithography to shrink chips to the 3nm…
May 5, 2022
As the top-notch semiconductor fabrication industry picks up angstroms as units instead of nanometres, the difficulty in shrinking the size transistor is reaching new heights.
April 28, 2022
Samsung ahead of Intel, TSMC with industrys first 3nm-class node.
April 22, 2022
Applied extends 2D EUV logic scaling with Stensar™ CVD alternative to spin-on patterning films Previews broadest portfolio of technologies for 3D Gate-All-Around transistors including two new IMS™ systems SANTA CLARA, Calif., April 21, 2022 (GLOBE NEWSWIRE) -- Applied Materials, Inc. today introduced innovations that help customers continue 2D scaling with EUV and detailed the industry’s…
April 21, 2022
Applied extends 2D EUV logic scaling with Stensar™ CVD alternative to spin-on patterning filmsPreviews broadest portfolio of technologies for 3D...