Kurt Ronse News Today

The patterning ecosystem around imec and ASMLs lithography system is taking shape.

Imec has made significant progress in preparing the High-NA patterning ecosystem for the imec-ASML Joint High-NA Lab, which will be centred around the firs

Imec and ASML show EUV limits Imec and ASML have demonstrated the ultimate single-exposure patterning capability of today’s 0.33NA NXE:3400 EUV lithography. Process optimizations have enabled the patterning of dense 28nm pitch line/spaces with an Inpria metal-oxide resist in one single exposure, relevant for high-volume manufacturing. For the first time, optical and e-beam inspections were correlated with electrical data to gain further insights in improving stochastic defectivity – i.e., ...

Imec Pushes Single-Exposure Patterning Capability of 0.33NA EUVL to its Extreme Limits Proven correlation between morphological and electrical data on 28nm pitch line/spaces increases understanding of stochastic defectivity impact on device reliability/yield LEUVEN (Belgium), February 23, 2021 — This week, at the 2021 SPIE Advanced Lithography Conference, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, and ASML, the world’s leading manufacturer...