Thin-film Measurement Techniques for High-Vacuum and High-Temperature Processes
SURAGUS and Fraunhofer FEP investigated measurement methods for the non-contact in-situ characterization of the electrical resistance of thin films under high vacuum and high temperature requirements.
United States Thomas Preu Fraunhofer Institute For Organic Electronics Saxon State Ministry Of Economics Saxon State Ministry For Economy Plasma Technology
Source: novuslight.com