Atomic Layer Deposition Method Reduces Use of Precious Metal

Researchers at UNIST’s Graduate School of Semiconductors Materials and Devices Engineering and Department of Materials Science and Engineering, under the direction of Professor Soo-Hyun Kim, have made significant strides toward the discovery of precisely controlled atomic layer deposition (ALD) incorporation of precious metals (Ru, Ir, Pt, and Pd).

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Megan Craig , Debananda Mohapatra , Soo Hyun Kim , Professor Research , National Research Foundation , School Of Semiconductors Materials , Ministry Of Science , Semiconductors Industry , Department Of Materials Science , Ulsan National Institute Of Science Technology , Semiconductors Materials , Devices Engineering , Materials Science , Professor Soo Hyun Kim , Ulsan National Institute , Industry Focus , Hyun Kim , Associate Professor , Graduate School , Process Controlled Ruthenium , Atomic Layer Deposition , Human Healthcare ,