Atomic Layer Deposition Method Reduces Use of Precious Metals
Researchers at UNIST’s Graduate School of Semiconductors Materials and Devices Engineering and Department of Materials Science and Engineering, under the direction of Professor Soo-Hyun Kim, have made significant strides toward the discovery of precisely controlled atomic layer deposition (ALD) incorporation of precious metals (Ru, Ir, Pt, and Pd).
Source: azonano.com