Dual Axis Yaw-and-Pitch Stages feature full range of motion

A new, series of Dual-axis Yaw-and-Pitch Stages have been introduced by Optimal Engineering Systems, Inc. (OES). This new series of high precision Yaw-and-Pitch stages are suitable for precise measurements of compound curves and angles of an object during inspection or reverse engineering, laser machining and drilling, scanning, tracking, mirror positioning, and for use with coordinate

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