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Eight new Yaw-and-Pitch Stages have been introduced by OES (Optimal Engineering Systems, Inc.). These new series of high-precision Yaw-and-Pitch Stages
A new, series of Dual-axis Yaw-and-Pitch Stages have been introduced by Optimal Engineering Systems, Inc. (OES). This new series of high precision Yaw-and-Pitch stages are suitable for precise measurements of compound curves and angles of an object during inspection or reverse engineering, laser machining and drilling, scanning, tracking, mirror positioning, and for use with coordinate