Why Optimal TKD and EBSD Results Require Evactron® Plasma Cleaning Sponsored by XEI ScientificMay 13 2021 In-situ plasma cleaning is crucial to avoid gradual contamination of vacuum chamber surfaces and samples at the time of analysis and characterization of nanocrystalline materials and nanostructures. A plasma cleaner is an essential accessory for the quick and efficient removal of hydrocarbon contamination from samples and vacuum chambers. ® plasma radical source functions at turbopump pressures and can produce low-temperature RF plasma with the help of its special RF hollow cathode, thereby enabling it to make oxygen radicals when air is the feed gas. The pumping system has the ability to eliminate gaseous phases developed by surface hydrocarbons by blending with the oxygen radicals.