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Researchers Use Pulsed Laser Deposition for Functional Oxide Integration

Published: August 25, 2022

In a preproof in journal Thin Solid Films, researchers have realized the epitaxial TiN films on (100) Si by reactive pulsed laser deposition (PLD).

Source: azooptics.com

Related Topics:

Rajeev Kumar RaiTaha KhanLaura ThomsonTaha KhanaugPavan Nukala Srinivasan RaghavanSandeep VuraResearch AreaThin Solid FilmsReactive Pulsed Laser DepositionLow Particulate DensityEpitaxial TinFunctional OxideLaser DepositionAlthough Ag CoPavan NukalaSrinivasan RaghavanThin Solid