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Oxford Instruments Plasma Technology announces significant order placements for plasma atomic layer deposition (ALD) and atomic layer etch (ALE) for GaN HEMT device production from several market-leading Japanese foundries.
23 November 2023 Significant orders of our GaN ALE and ALD Systems Oxford Instruments Receives Orders for GaN ALE and ALD Systems from Several Key Japanese...
30 June 2023 A substantial Equipment Shipment to the GEECI in IISc The GaN Ecosystem Enabling Center and Incubator , a MeitY and FSID-IISc Bangalore initiative,...
Leading New York Research Centre Installs Oxford Instruments Plasma Technology ALD System to Accelerate Atomic Scale Processing to High Volume Manufacturing.
28 April 2023 SUNY Poly instals our ALD system Leading New York Research Centre Instals Oxford Instruments Plasma Technology ALD System to Accelerate Atomic... | April 28, 2023