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Cadence Design Systems has announced an expanded collaboration with Arm to speed up data centre silicon development using the Arm Neoverse V2 platform.
Highlights: Cadence optimized its AI-driven RTL-to-GDS digital flow and delivered corresponding 5nm and 3nm RAKs for the Arm Neoverse V2 platform, enabling designers to get to market...
Highlights: • Certification enables customers to advance the design of aerospace, hyperscale computing, AI, mobile and consumer applications using Cadence and GF® technologies • Cadence digital full flow optimized for the GF 12LP/LP+ process platforms enables mutual customers to reach PPA goals faster and deliver new products to market with shorter design cycles SAN JOSE,…
Cadence and UMC collaborate on 22ULP/ULL reference flow certification Cadence Design Systems and the semiconductor foundry, UMC, have announced that the Cadence digital full flow has been optimised and certified for the UMC 22ULP/ULL process technologies to accelerate consumer, 5G and automotive application design. The flow, which incorporates leading implementation and signoff technology for ultra-low power designs, will enable customers to achieve a much faster path to tape-out. The Cadence digital full flow that has been optimized for use on UMCâs 22ULP/ULL pro...