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Keysight Technologies Expands Relationship With Ansys To Deliver Wireless Design Workflow Solutions


Keysight Technologies Expands Relationship With Ansys To Deliver Wireless Design Workflow Solutions
SANTA ROSA, CALIF. (BUSINESS WIRE)
Keysight Technologies, Inc. (NYSE: KEYS), a leading technology company that delivers advanced design and validation solutions to help accelerate innovation to connect and secure the world, announced an expanded collaboration with Ansys to integrate Keysight’s PathWave Advanced Design System (ADS) RFPro environment with Ansys HFSS electromagnetic simulation.
As a result of this collaboration, radio frequency (RF) and microwave engineers can eliminate the time-consuming bottleneck of manually coupling design tools to simplify workflow and improve time-to-market. The initial collaboration between the two companies, originally announced in February 2021, improved the workflow between the companies products to speed time-to-market for 5G, aerospace and defence, as well as automotive applications. ....

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Keysight and Transphorm Create Power Supply Reference Design That Lowers Product Costs; Speeds Time to Market


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Keysight Technologies, Inc. (NYSE: KEYS), a leading technology company that helps enterprises, service providers and governments accelerate innovation to connect and secure the world, and Transphorm, Inc. (OTCQB: TGAN), a global supplier of high reliability, high performance gallium nitride (GaN) power conversion products, have announced the availability of a new power supply reference design that enables engineers to identify and correct design errors before building hardware, thereby lowering product costs and speeding time to market.
Switched-mode power supplies provide greater efficiency, increased power density and lower overall system costs when using GaN devices. However, GaN, a high switching speed, high performance wide bandgap semiconductor, can produce voltage spikes that result in detrimental radiated electromagnetic interference. As a result, optimized layout design and placement o ....

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