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The NSR-S625E argon fluoride (ArF) immersion scanner from Nikon Corp. is optimized for middle critical layers. The lithography system provides en

May 10, 2021 Twenty-four years ago, physics professor Harold Craighead and then-doctoral student Dustin Carr, Ph.D. ’00, created the world’s smallest guitar using cutting-edge technology in what was then the Cornell Nanofabrication Facility. They’re at it again at the center – now known as the Cornell NanoScale Science and Technology Facility (CNF), in Duffield Hall. A team led by staff photolithographer Ed Camacho has created what is thought to be the world’s smallest rendition of Cornell’s iconic McGraw Tower – complete with its 161 interior steps, two sets of stairs and 21 be...

Share this article Share this article MELVILLE, N.Y., April 8, 2021 /PRNewswire/ -- Canon U.S.A., Inc., a leader in digital imaging solutions, today announced that its parent company, Canon Inc., has launched the FPA-5520iV LF Option for back-end process semiconductor lithography systems. This device features an i-line stepper 1 with a 1.5 micrometer 2 resolution and a wide exposure field of 52 mm x 68 mm for advanced packaging 3. Canon Commences Sales of the FPA-5520iV LF Option for Back-End Process Semiconductor Lithography Systems In the field of semiconductor chip performance enhancement...