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Development of 3kV-Class Gallium Oxide Epitaxial Layer and Device Technologies

Published: April 24, 2024

Electronics and Telecommunications Research Institute (ETRI) of Korea and its research team have successfully developed core material and device process technol

Source: newswise.com

Related Topics:

South KoreaUnited StatesMun Jae KyoungSemiconductor FieldKorea Gallium Oxide Technology Research AssociationNational Core Material Research GroupKorea Institute Of Ceramic EngineeringJapan Yano Research InstituteTelecommunications Research InstituteMetal Oxide Semiconductor Field Effect TransistorKorea InstituteCeramic EngineeringJeon Dae WooMetal Organic Chemical Vapor DepositionYano Research InstituteKorea Gallium Oxide Technology ResearchMaterials Technology Development ProgramPplied Sciences And EngineeringNational Research Council Of Science And Technology