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CNN CNN Newsroom June 4, 2024 17:51:00

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CNN Erin Burnett OutFront June 4, 2024 23:24:00

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Development of advanced lithography technology (I): extension of the existing equipment path

Lithography technology is a mainstream means used by the semiconductor industry to define fine patterns. At present, the most advanced technology is EUV (extreme ultraviolet), and the latest mass production equipment is ASML s TWINSCAN NXE: 3600D. The light source used is 13.5nm EUV light produced by carbon dioxide laser hitting the tin (Sn) plasma. The numerical aperture (NA) is 0.33, which is inversely proportional to the resolution or critical dimension (CD); the larger the NA, the better the lithography performance. Its resolution is 13nm, . ....

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