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Top News In ஒன்றுபட்டது மாநிலங்களில் இன்க் ஃபெப் Today - Breaking & Trending Today

JEOL Introduces New Configuration of Its Broad Ion Beam Milling Cross Section

JEOL Introduces New Configuration of Its Broad Ion Beam Milling Cross Section
JEOL USA introduces a new configuration of its bestselling broad ion beam milling instrument, the Cross-section Polisher (CP). The CP is widely used for preparing pristine samples prior to high-resolution imaging and elemental analysis with the Scanning Electron Microscope (SEM). The upgraded configuration includes high-speed milling, sputter coating, cryo-preparation (down to LN2 temperature), and air-isolated transfer for atmosphere-sensitive specimens (for example Li batteries).
Traditional mechanical preparation of specimen surfaces for SEM imaging can introduce various artifacts, such as scratches and embedded polishing media, that obscure the original microstructure, crystallographic information, and precise layer thickness measurements. Broad ion beam polishing using the JEOL cross-section polisher (CP) offers pristine surface preparation with minimal artifacts. The JEOL CP is a tabletop i ....

United States , Natasha Erdman , United States Inc Feb , Inc Feb , Cross Section Polisher , Scanning Electron Microscope , Ion Beam Product Manager , ஒன்றுபட்டது மாநிலங்களில் , நடாஷா எர்ட்மான் , ஒன்றுபட்டது மாநிலங்களில் இன்க் ஃபெப் , இன்க் ஃபெப் , குறுக்கு பிரிவு பாலிஶர் , ஸ்கேனிங் எதிர் மின்னணு நுண்ணோக்கி , அயன் உத்திரம் ப்ராடக்ட் மேலாளர் ,

JEOL Introduces New Time-of-Flight Mass Spectrometer JMS-T2000GC AccuTOF™ GC-Alpha

JEOL Introduces New Time-of-Flight Mass Spectrometer JMS-T2000GC AccuTOF™ GC-Alpha
JEOL builds upon its legacy of successful AccuTOFTM GC series gas chromatograph – time-of-flight mass spectrometers with the release of the JMS-T2000GC AccuTOF™ GC-Alpha . This product is a GC-MS that represents a significant improvement in performance and functionality using two newly developed key technologies. The basic hardware performance has been greatly improved and a new generation of automated data analysis software is included in the standard configuration.
High-Performance Hardware
The JMS-T2000GC “AccuTOF™ GC-Alpha”, the 6th generation of the successful AccuTOF™ GC series, features new high-performance hardware that achieves three times the mass resolving power and mass measurement accuracy of the previous “AccuTOF™ GCx-plus” by using a whole new ion optics design that achieves excellent sensitivity and high data acquisition speed, the long-time hallmark ....

United States , United States Inc Feb , Inc Feb , Streamlined Data , Volcano Plots , ஒன்றுபட்டது மாநிலங்களில் , ஒன்றுபட்டது மாநிலங்களில் இன்க் ஃபெப் , இன்க் ஃபெப் , நெறிப்படுத்தப்பட்டது தகவல்கள் , எரிமலை ப்லாட்ஸ் ,

TESCAN Announces their New Nanomanipulator for Lift-Out and Manipulation Applications Performed in TESCAN SEM and FIB-SEM Instruments

From TESCAN USA Inc. ....

United States , United States Inc Feb , Portfolio For The Semiconductor Market , States Inc Feb , Product Manager , Semiconductor Market , ஒன்றுபட்டது மாநிலங்களில் , ஒன்றுபட்டது மாநிலங்களில் இன்க் ஃபெப் , போர்ட்‌ஃபோலீயோ க்கு தி குறைக்கடத்தி சந்தை , மாநிலங்களில் இன்க் ஃபெப் , ப்ராடக்ட் மேலாளர் , குறைக்கடத்தி சந்தை ,

TESCAN Announces a Fully Integrated Hardware and Software Solution for Adding Electron Beam Lithography Capability to TESCAN SEM and FIB-SEM Instruments

TESCAN Announces a Fully Integrated Hardware and Software Solution for Adding Electron Beam Lithography Capability to TESCAN SEM and FIB-SEM Instruments
TESCAN Essence™ EBL Kit features a software module that controls the electron beam lithography (EBL) process from within the Essence™ microscope control software to enable efficient prototyping of micro- and nanoscale structures and devices.
TESCAN ORSAY HOLDING a.s. announces the release of their Essence
™ EBL Kit, a fully integrated, dedicated solution that adds electron beam lithography capabilities to TESCAN SEM and FIB-SEM instruments. Working in conjunction with TESCAN’s fast electrostatic beam blanker, the Essence
™ EBL Kit offers a pathway for multi-user research labs to fulfill requirements for prototyping micro and nanoscale structures and devices while also providing access to the imaging and analysis capabilities of SEM and FIB-SEM. ....

United States , United States Inc Feb , States Inc Feb , Product Manager Special Applications , ஒன்றுபட்டது மாநிலங்களில் , ஒன்றுபட்டது மாநிலங்களில் இன்க் ஃபெப் , மாநிலங்களில் இன்க் ஃபெப் , ப்ராடக்ட் மேலாளர் சிறப்பு பயன்பாடுகள் ,