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Imec Pushes Single-Exposure Patterning Capability of 0.33NA EUVL to its Extreme Limits


Imec Pushes Single-Exposure Patterning Capability of 0.33NA EUVL to its Extreme Limits
Proven correlation between morphological and electrical data on 28nm pitch line/spaces increases understanding of stochastic defectivity impact on device reliability/yield
LEUVEN (Belgium), February 23, 2021 This week, at the 2021 SPIE Advanced Lithography Conference, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, and ASML, the world’s leading manufacturer of semiconductor lithography equipment, present several papers that demonstrate the ultimate single-exposure patterning capability of today’s 0.33NA NXE:3400 extreme ultraviolet lithography (EUVL). Process optimizations have enabled the patterning of dense 28nm pitch line/spaces with an Inpria metal-oxide resist in one single exposure, relevant for high-volume manufacturing. For the first time, optical and e-beam inspections were correlated with electrical data to gain further insig ....

United States , Region Flamande , Andrew Grenville , Kurt Ronse , Steven Scheer , Lithography Conference , ஒன்றுபட்டது மாநிலங்களில் , ஆண்ட்ரூ கிரென்வில்லே , ஸ்டீவன் ஸ்கீயர் , லித்தோகிராபி மாநாடு ,