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Nanotechnology Now - Press Release: Argonne researchers use AI to optimize a popular material coating technique in real time


Nanotechnology Now
Home > Press > Argonne researchers use AI to optimize a popular material coating technique in real time
(Image by Fotogrin/Shutterstock.)
Abstract:
To make computer chips, technologists around the world rely on atomic layer deposition (ALD), which can create films as fine as one atom thick. Businesses commonly use ALD to make semiconductor devices, but it also has applications in solar cells, lithium batteries and other energy-related fields.
Argonne researchers use AI to optimize a popular material coating technique in real time
Argonne, IL | Posted on June 25th, 2021
Today, manufacturers increasingly rely on ALD to make new types of films, but figuring out how to tweak the process for each new material takes time. ....

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