TESCAN Announces a Fully Integrated Hardware and Software Solution for Adding Electron Beam Lithography Capability to TESCAN SEM and FIB-SEM Instruments
TESCAN Essence™ EBL Kit features a software module that controls the electron beam lithography (EBL) process from within the Essence™ microscope control software to enable efficient prototyping of micro- and nanoscale structures and devices.
TESCAN ORSAY HOLDING a.s. announces the release of their Essence
™ EBL Kit, a fully integrated, dedicated solution that adds electron beam lithography capabilities to TESCAN SEM and FIB-SEM instruments. Working in conjunction with TESCAN’s fast electrostatic beam blanker, the Essence
™ EBL Kit offers a pathway for multi-user research labs to fulfill requirements for prototyping micro and nanoscale structures and devices while also providing access to the imaging and analysis capabilities of SEM and FIB-SEM.