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From the deepest stretches of the ocean to the farthest reaches of the sky, Filipino scientists are adding to humanity’s collective knowledge of the world.

27 HBCUs and historically Black medical schools have been awarded $20 million as part of a 10-year commitment from the two foundations.

Our NanoNews Digest Sponsors Home > Press > Stress-free path to stress-free metallic films paves the way for next-gen circuitry: Optimized sputtering technique helps minimize stress in tungsten thin films (top left) An illustration of the HiPIMS process (top right) The energy distribution of tungsten ions arriving at the substrate over time. At short times, there are a large proportion of ions with high energy. (bottom) Stress-free tungsten films created with the selective pulsed bias technique. (a) Plan view transmission electron microscopy (TEM) image of the film; (b) a higher resolution im...

 E-Mail IMAGE: (top left) An illustration of the HiPIMS process (top right) The energy distribution of tungsten ions arriving at the substrate over time. At short times, there are a large proportion... view more  Credit: Tokyo Metropolitan University Tokyo, Japan - Researchers from Tokyo Metropolitan University have used high power impulse magnetron scattering (HiPIMS) to create thin films of tungsten with unprecedentedly low levels of film stress. By optimizing the timing of a "substrate bias pulse" with microsecond precision, they minimized impurities and defects to form crystalli...