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Nvidia's cuLitho makes it look like a blast from the past but points to changes in how chip designs are done.

SAN JOSE, Calif., February 28, 2023—The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announces the addition of two new company members to the organization: EUV Tech, a pioneering leader in actinic EUV metrology equipment; and IBM, an industry leader and…

SAN FRANCISCO, CA – April 28, 2022 – The Design Automation Conference (DAC) returns for its 59th year with an all-start line up of Keynotes, SKYTalks and TechTalks. Founded in 1964, DAC is the longest-running and largest event focused on research and technology for the design and the design automation of electronic chips to systems. The conference is recognized…

Foundry Wars Begin Intel’s re-entry has kicked the competition into high gear, with massive spending on equipment and new fabs. Leading-edge foundry vendors are gearing up for a new, high-stakes spending and technology race, setting the stage for a possible shakeup across the semiconductor manufacturing landscape. In March, Intel re-entered the foundry business, positioning itself against Samsung and TSMC at the leading edge, and against a multitude of foundries working at older nodes. Intel announced plans to build two new fabs with a capital spending budget set at $20 billion in 2021. Ear...

Petaflop era for semiconductor manufacturing January 29, 2021 // By Nick Flaherty Computational Design Platform from DS2 with Nvidia A40 GPU achieves 1.8 PFLOPS for designing masks D2S has launched its seventh generation of its computational design platform (CDP) for designing the complex masks for chip making. The CDP uses Nvidia’s latest GPU chips to reach petaflop performance for 5nm and 3nm manufacturing. This is used for the calculations for inverse lithography technology (ILT) to produce curvilinear shapes on photomasks, mask process correction (MPC) for mu...