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TKD and EBSD: Why the Best Results Require Evactron® Plasma Cleaning


Sponsored by XEI ScientificMar 4 2021
In order to avoid progressive contamination of samples and vacuum chamber surfaces during analysis and characterization of nanocrystalline materials and nanostructures, in-situ plasma cleaning is essential.
For effectively and rapidly eliminating hydrocarbon contamination from samples and vacuum chambers, a necessary accessory is a plasma cleaner.
The Evactron plasma radical source operates at turbopump pressures and can generate a low temperature RF plasma using its unique RF hollow cathode, allowing it to create oxygen radicals when air is the feed gas.
The pumping system removes gaseous phases formed by surface hydrocarbons combining with the oxygen radicals.
Plasma cleaning has many benefits, including no damage to EDS detectors or x-ray windows due to oxygen radial generation, prevention of hydrocarbon deposition during imaging, improved image quality of serial block-face SEM volumetric sets and faster pump-down times. ....

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Plasma De-Contaminator for UHV Chambers: Evactron® U50 : Quote, RFQ, Price and Buy


The Evactron U50 Plasma De-Contaminator is a compact, simple plasma cleaner featuring high performance for chambers and instruments engineered to function at UHV conditions. The U50 offers high power cleaning to eliminate hydrocarbon contamination on sample and chamber surfaces.
The Evactron U50 De-Contaminator has been engineered for facilities that choose to use a wired touchpad interface to program cleaning parameters. An RS-232 cable is used to connect the touchpad (with dimensions of 134 × 112 × 69 mm) to the controller.
With a compact footprint, the simplified PRS makes use of UV afterglow and air plasma to minimize hydrocarbon contamination, delivering results quickly.
The design of the Evactron U50 Plasma Radical Source (PRS) is compact, making it a universal solution for sample prep chambers, load locks, or instrument chambers. The Evactron U50 provides effective, quick and robust cleaning across an extensive range of pressures, thus facilitating fast pump ....

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