Stay updated with breaking news from White Light Interferometry. Get real-time updates on events, politics, business, and more. Visit us for reliable news and exclusive interviews.
Because of their ever-increasing use in a variety of applications, microlenses and their design are constantly being improved to reduce distortion, astigmatism, or other problems that can impede observation. In this article, Bruker explains how white light interferometry can be used to characterize microlenses.
Bruker Nano discusses the use of mean roughness measurements with white light interferometry (WLI) optical profilers
This article outlines why gage-capable metrology process control is essential for industrial applications.
/PRNewswire/ -- The "Laser Interferometer Market with COVID-19 Impact Analysis by Interferometer Type (Michelson, Fabry-Perot, Fizeau, and Twyman-Green), Type,...
Chemical mechanical polishing (CMP) – also known as planarization – has long been the most commonly employed technique for smoothing and flattening wafer surfaces during the fabrication of semiconductor integrated chips (IC). This approach has been common practice for decades. During this time, post-CMP evaluation has become the standard means of ensuring adequate planarity of IC layers, as well as the most common approach to confirming their compliance with planarity requirements. Conventional post-CMP process evaluation methods have analytical limitations, however. Ever tightening proce...